Asus sabertooth z170 s drivers
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SABERTOOTH Z S. Find another model. Get Product Support. Register Product. The innovative and new-age digital Camouflage integrates into the motherboard to achieve high stealth action in every mission possible; SABERTOOTH Z S presents extreme durability with many exclusive TUF features – TUF ICe, TUF Thermal Radar 2 and TUF Detective 2 for ultimate cooling, strength and easy monitoring and control. Intel® Z Express-based motherboard Category: Intel-Platform. -Video-ASUS TUF SABERTOOTH X79 Motherboard-Video-ASUS TUF SABERTOOTH FX Motherboard-Video-ASUS TUF SABERTOOTH P67 Motherboard All Models. Previous. Next. TUF SABERTOOTH FX R SABERTOOTH Z S. SABERTOOTH Z MARK 1. TROOPER B D3. SABERTOOTH X TROOPER H D3. SABERTOOTH Z97 MARK S. SABERTOOTH Z97 MARK 1. SABERTOOTH .
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SABERTOOTH Z MARK 1 Thermal Radar 2’s fan management has been expanded — so now you can control fans on ASUS graphics cards, as well as multiple case fans! With customizable settings for each fan, you can tune the Dust de-Fan technology to extend your motherboard’s lifespan. Switch on your PC and Dust de-Fan briefly spins in reverse Category: Intel-Platform. -Video-ASUS TUF SABERTOOTH X79 Motherboard-Video-ASUS TUF SABERTOOTH FX Motherboard-Video-ASUS TUF SABERTOOTH P67 Motherboard All Models. Previous. Next. TUF SABERTOOTH FX R SABERTOOTH Z S. SABERTOOTH Z MARK 1. TROOPER B D3. SABERTOOTH X TROOPER H D3. SABERTOOTH Z97 MARK S. SABERTOOTH Z97 MARK 1. SABERTOOTH . ASUS Premium Care Contact Us Commercial Support Deal Registration MyASUS Product Registration Rebate Center Security Advisory ASUS Support Videos About Us About ASUS Careers Corporate Social Responsibility News.
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Canon: shifts in hardware design for 0.07 micron process technology
Canon today announced significant progress in developing 157nm scanners for 70nm lithography.
As we have reported many times, the main reason for the delay in the development of equipment for the production of chips using a new, more precise process technology was the problems with the projection optics, more precisely, the problems with birefringence (intrinsic birefringence, IBR) inherent in lenses made of calcium fluoride (CaF2).
Canon U Semiconductor Equipment Division.S.A. made a statement in which it reported significant progress towards the development of 157 nm projection optics, in particular, major modifications to the configuration of optical systems, allowing to bypass IBR. And now, according to company representatives, they will be ready to provide the first generation of exposure systems for nodes of the order of 70 nm for comprehensive testing and testing already in the first half of 2021 (by the way, the first consumer who firmly announced the acquisition of the new system was the German Infineon Technologies AG, intending to start production according to the technical process from Canon as early as 2021).
To summarize: the development of catadioptric lenses, which we wrote about in the summer, was successful, as Canon reported in its regular SubMicron Focus circular, and now, on the basis of these optics, the FPA-5800FS1 industrial system will be developed. So far, the company guarantees that the new optics will get rid of the refractive effect of rays within 100 nm lithography, and work on a more precise process will be based on the same principle – the main thing is that it turned out to be correct. If the IBR problem is really solved by optimizing the orientation of the lenses – well, I think, other manufacturers of lithographic equipment will also report on their options for solving the problem soon. Let’s hope.Source: Silicon Strategies